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This is a good example of why science isn't a popularity contest. The top voted reply makes some vague noises about vt-scaling and leakage. It then claims that we "don't get a very good "off" if the threshold voltage is too low". This is incorrect. Leakage doesn't degrade the logic values for CMOS-style logic, which is the vast majority of the digital logic in the world.

The real issue which the OP may or may have been trying to get at is that leakage power eats into the chip's power budget. Since we'd rather not burn our budget on leakage, we reduce leakage by increasing the threshold voltage. But unfortunately, this comes at the cost of frequency.

The other very important issue is that of power-density. There's a famous graph that Shekar Borkar of Intel [1] made showing that if we continued to ignore power dissipation issues like in the past our chips would run ridiculously hot (IOW, they wouldn't work at all because they'd just burn themselves to death).

There are also other issues like the fact that your wires start acting like antennas at 5+ GHz and that reliability concerns like electromigration and dielectric breakdown are getting worse with newer technologies.

A much more recent and reliable (not to mention highly-cited) reference on scaling and power issues is [2].

[1] I found a copy here: http://www.nanowerk.com/spotlight/id1762_1.jpg [2] http://www-vlsi.stanford.edu/papers/mh_iedm_05.pdf



While I agree that power is the primary issue leakage does have a correlation with "degrading the off" value.

Specifically the effects of drain induced barrier lowering becomes very significant in the sub-threshold region as the channel length is reduced. This has the effect of both increasing drain current (leakage) and making the transistor more difficult to turn off, that is a larger gate bias is required to turn the transistor off.

While "leakage" isn't the cause, you do get leakage and a harder to turn off transistor at the same time, at least for this type of leakage.


Hmm. In a CMOS structure with a weakly turned off device, you'd need the effective off resistance to be more than 1/20th of the effective on for the logic value to degrade by roughly 5%. Did we have such leaky transistors for 130nm/90nm when the shift happened?

A quick calculation I did with a 90nm model for I have some parameters with vt=0.3, vdd=1.2, subthreshold slope=90mV/decade and dibl coeff=0.1 seems to suggest that leakage would still be < 1/100th of the on current.


I believe we're talking about two separate issues, maybe this will help: http://en.wikipedia.org/wiki/Drain_Induced_Barrier_Lowering


I don't think so. The effect of DIBL is an increase in leakage current with the drain to source voltage.

The first-order model I was taught in school was that leakage current not considering DIBL used to be proportional to exp(vgs-vt) but thanks to DIBL leakage is now proportional to exp(vgs - vt + eta*vds). The eta here is the DIBL coefficient, which AFAIK is 0.1 or thereabouts.


The first-order model falls apart as channel length decreases.


I would guess the concerns are less about corrupting results, and more about leakage power and switching speed. If you have a very leaky pulldown, switching to "1" is going to be slower.


I'm not convinced for the same reason I posted above. The on-current is at least an order of magnitude higher than the off-current for all technology nodes that I know of.

The only way I see this having a significant effect is through the vt vs. speed trade-off I mentioned above. Lower vt's exponentially increase leakage power, so we push the vt up to combat leakage, but this reduces transistor speed because frequency is roughly proportional to the on-current which is roughly proportional to gate overdrive vdd - vt.




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